The natural evolution of functional materials' architecture
calls for their confinement in spatial and dimensional
modes. Here, spatial confinement refers to inevitable attachment of
materials to a substrate or an overlayer(s), for example. Dimensional constraint
arises from the ubiquitous need for materials to be confined to 0- (i.e.,
dots), 1- (lines) and 2- (i.e., films/membranes) dimensions to enhance aerial
density and possible novel properties. Further, by juxtaposing two or more
functional materials in close proximity, there are exciting new opportunities
for synergistic coupling of disparate phenomena in hybrid
confined materials systems.
Thus, our objectives span fundamental studies of spatial/dimensional confinement to harnessing their technological opportunities and everything in-between.
Embedded in these initiatives are varied nanopatterning approaches, in-situ and ex-situ characterization of nanopatterns, using photon (light, synchrotron), ion, scanning probe and electron microscopy.
Representative Publications:
- Su M., Dravid VP, et al., "Moving beyond molecules: Patterning solid-state features via dip-pen nanolithography with sol-based inks", J. Amer. Chem. Soc., 124 (8): 1560-1561 (2002)
- Myers BD, Dravid VP, "Variable pressure electron beam lithography (VP-eBL): A new tool for direct patterning of nanoscale features on substrates with low electrical conductivity", Nano Letters, 6 (5): 963-968 (2006)
- Pan ZX, Dravid VP et al., "Directed fabrication of radially stacked multifunctional oxide heterostructures using soft electron-beam lithography", Small 2 (2): 274-280 (2006).
Links to Other Dravid Group Research Themes: