VPD Group

Fengyuan Shi, Ph.D.

Xin Wang, PhD

Research Specialist, UIC, IL 

Education

2013 - 2016      Postdoc at Northwestern University

2008 - 2013      Ph.D. in Materials Science in University of Wisconsin-Madison                                 

2004 - 2008      B.S. in Materials Science in University of Science and Technology of China     

Research Objectives and Approach

Transmission electron microscopy and microanalysis on thermoelectric materials and functional 2D materials. 

Journal Publications

  1. Xiang, Hua; Shi, Fengyuan; Rzchowski, Mark S; Voyles, Paul M; Chang, Y Austin,"Epitaxial growth and magnetic properties of Fe 3 O 4 films on TiN buffered Si (001), Si (110), and Si (111) substrates",Applied Physics Letters,97,9,092508-092508-3,2010,AIP
  2. Reyes-Luyanda, Damian; Flores-Cruz, Josseant; Morales-Pérez, Pedro J; Encarnación-Gómez, Luis G; Shi, Fengyuan; Voyles, Paul M; Cardona-Martínez, Nelson, Bifunctional materials for the catalytic conversion of cellulose into soluble renewable biorefinery feedstocks,Topics in catalysis,55,3-4,148-161,2012,Springer US
  3. Berkels, B; Sharpley, R; Binev, P; Yankovich, A; Shi, F; Voyles, P; Dahmen, W, High precision STEM imaging by non-rigid alignment and averaging of a series of short exposures,Microscopy and Microanalysis,18,S2,300-301,2012,Cambridge University Press
  4. Shi, Fengyuan; Xiang, Hua; Yang, J Joshua; Rzchowski, MS; Chang, YA; Voyles, PM, Inverse TMR in a nominally symmetric CoFe/AlO< sub> x</sub>/CoFe junction induced by interfacial Fe< sub> 3</sub> O< sub> 4</sub> investigated by STEM-EELS,Journal of Magnetism and Magnetic Materials,324,10,1837-1844,2012,Elsevier
  5. Shi, Fengyuan; Xiang, Hua; Chang, Y; Voyles, PM; Rzchowski, MS, "STEM and STEM EELS Characterization of Low Defect Density, Smooth Fe3O4 Thin Films on Buffered Si by Kinetically Controlled Selective Oxidation",Microscopy and Microanalysis,18,S2,322-323,2012,Cambridge University Press
  6. Shi, Fengyuan; Xiang, Hua; Rzchowski, MS; Chang, YA; Voyles, PM, "High-Quality, Smooth Fe3O4 Thin Films on Si By Controlled Oxidation of Fe in CO/CO2",MRS Proceedings,1430,,mrss12-1430-e03-15,2012,Cambridge Univ Press
  7. Li, Wei; Tian, Ting-Fang; Shi, Feng-Yuan; Wang, Yue-Song; Chen, Chu-Sheng;, Ce0. 8Sm0. 2O2− δ− La0. 8Sr0. 2MnO3− δ Dual-Phase Composite Hollow Fiber Membrane for Oxygen Separation,Industrial & Engineering Chemistry Research,48,12,5789-5793,2009,ACS Publications
  8. Xiang, H; Shi, F-Y; Rzchowski, MS; Voyles, PM; Chang, YA, "Reactive sputtering of (Co, Fe) nitride thin films on TiN-bufferd Si",Applied Physics A,110,2,487-492,2013,Springer
  9. Xiang, H; Shi, F-Y; Rzchowski, MS; Voyles, PM; Chang, YA, Epitaxial growth and thermal stability of Fe4N film on TiN buffered Si (001) substrate,Journal of Applied Physics,109,7,07E126,2011,AIP Publishing
  10. Xiang, H; Shi, F-Y; Zhang, C; Rzchowski, MS; Voyles, PM; Chang, YA,  Synthesis of Fe3O4 thin films by selective oxidation with controlled oxygen chemical potential,Scripta Materialia,65,8,739-742,2011,Pergamon
  11. Shi, Fengyuan; Liu, Hongxi; Yamamoto, Masafumi; Voyles, Paul M; ",MnMn/O Interface Termination at the Co2MnαSi/MgO Interface in Magnetic Tunnel Junctions Investigated by Scanning Transmission Electron Microscopy,Microscopy and Microanalysis,19,S2,336-337,2013,Cambridge University Press
  12. O'Neill, Brandon J; Jackson, David HK; Crisci, Anthony J; Farberow, Carrie A; Shi, Fengyuan; Alba‐Rubio, Ana C; Lu, Junling; Dietrich, Paul J; Gu, Xiangkui; Marshall, Christopher L; ",Stabilization of Copper Catalysts for Liquid‐Phase Reactions by Atomic Layer Deposition,Angewandte Chemie,125,51,14053-14057,2013,WILEY‐VCH Verlag
  13. O'Neill, Brandon J; Jackson, David HK; Crisci, Anthony J; Farberow, Carrie A; Shi, Fengyuan; Alba‐Rubio, Ana C; Lu, Junling; Dietrich, Paul J; Gu, Xiangkui; Marshall, Christopher L; ",Back Cover: Stabilization of Copper Catalysts for Liquid‐Phase Reactions by Atomic Layer Deposition (Angew. Chem. Int. Ed. 51/2013),Angewandte Chemie International Edition,52,51,13824-13824,2013,WILEY‐VCH Verlag
  14. O'Neill, Brandon J; Jackson, David HK; Crisci, Anthony J; Farberow, Carrie A; Shi, Fengyuan; Alba‐Rubio, Ana C; Lu, Junling; Dietrich, Paul J; Gu, Xiangkui; Marshall, Christopher L; ",Rücktitelbild: Stabilization of Copper Catalysts for Liquid‐Phase Reactions by Atomic Layer Deposition (Angew. Chem. 51/2013),Angewandte Chemie,125,51,14068-14068,2013,WILEY‐VCH Verlag
  15. Li, Gui-fang; Honda, Yusuke; Liu, Hong-xi; Matsuda, Ken-ichi; Arita, Masashi; Uemura, Tetsuya; Yamamoto, Masafumi; Miura, Yoshio; Shirai, Masafumi; Saito, Toshiaki; ",Effect of nonstoichiometry on the half-metallic character of Co 2 MnSi investigated through saturation magnetization and tunneling magnetoresistance ratio,Physical Review B,89,1,014428,2014,American Physical Society
  16. Alba Rubio, Ana Carolina; O'Neill, Brandon; Shi, Fengyuan; Akatay, Cem; Canlas, Christian; Li, Tao; Winans, Randall E; Elam, Jeffrey W; Stach, Eric A; Voyles, Paul M; ",Pore structure and bifunctional catalyst activity of overlayers applied by atomic layer deposition on copper nanoparticles,ACS Catalysis, (2014), American Chemical Society
  17. Tan, Gangjian; Zhao, Li-Dong; Shi, Fengyuan; Doak, Jeff W; Lo, Shih-Han; Sun, Hui; Wolverton, Chris; Dravid, Vinayak P; Uher, Ctirad; Kanatzidis, Mercouri G; ",High Thermoelectric Performance of p-Type SnTe via a Synergistic Band Engineering and Nanostructuring Approach,Journal of the American Chemical Society, (2014)